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This innovative NASA process begins with the deposition of an Al layer onto an optically smooth glass substrate using a high-vacuum PVD system. Unlike conventional methods where the Al surface is immediately exposed to air or coated with LiF, this new technique entails an initial exposure of the fresh Al film to XeF2 gas. This step chemically passivates the Al surface, forming a thin (~2.5-3.2 nm) protective layer of aluminum fluoride (AlF3). This barrier prevents oxidation and contamination of the aluminum before the LiF layer is applied, preserving its reflectivity. Following the XeF2 treatment, a flash-evaporated LiF overcoat is deposited onto the Al surface using a conventional PVD process. Deposition is performed at a high rate to increase the density of the LiF layer, enhancing its environmental stability and optical performance. Immediately after the LiF deposition, the mirror undergoes a second XeF2 exposure, further passivating the surface. This dual XeF2 treatment is key to the improved durability of the mirrors, as it effectively seals the interfaces and prevents degradation over time. One of the most significant advantages of this process is that it is performed entirely at room temperature, eliminating the need for high-temperature deposition techniques conventionally used for such coatings. Extensive testing of these new mirrors has demonstrated their performance and durability. Testing of prototypes optimized for 121.6 nm demonstrated 92.6% reflectivity, surpassing all previously reported values for Al/LiF coatings. Long-term environmental testing has shown that these mirrors maintain their high reflectance even after months of storage in moderate humidity conditions. Further stress testing in environments with 50-60% humidity for three weeks resulted in a reflectance reduction of about 2%, demonstrating high environmental stability. This NASA invention is available for patent licensing to industry.